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Recovery of off-state stress-induced damage in FET-type gas sensor using self-curing method

Cited 3 time in Web of Science Cited 3 time in Scopus
Authors

Shin, Wonjun; Jeong, Yujeong; Kim, Mingyu; Lee, Jungsoo; Koo, Ryun-Han; Hong, Seongbin; Jung, Gyuweon; Kim, Jae-Joon; Lee, Jong-Ho

Issue Date
2023-02
Publisher
Springer Verlag
Citation
Nanoscale Research Letters, Vol.18 No.1, p. 11671
Abstract
The need for high-performance gas sensors is driven by concerns over indoor and outdoor air quality, and industrial gas leaks. Due to their structural diversity, vast surface area, and geometric tunability, metal oxides show significant potential for the development of gas sensing systems. Despite the fact that several previous reports have successfully acquired a suitable response to various types of target gases, it remains difficult to maintain the reliability of metal oxide-based gas sensors. In particular, the degradation of the sensor platform under repetitive operation, such as off-state stress (OSS) causes significant reliability issues. We investigate the impact of OSS on the gas sensing performances, including response, low-frequency noise, and signal-to-noise ratio of horizontal floating-gate field-effect-transistor (FET)-type gas sensors. The 1/f noise is increased after the OSS is applied to the sensor because the gate oxide is damaged by hot holes. Therefore, the SNR of the sensor is degraded by the OSS. We applied a self-curing method based on a PN-junction forward current at the body–drain junction to repair the damaged gate oxide and improve the reliability of the sensor. It has been demonstrated that the SNR degradation caused by the OSS can be successfully recovered by the self-curing method.
ISSN
1931-7573
URI
https://hdl.handle.net/10371/219342
DOI
https://doi.org/10.1186/s11671-023-03801-z
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Research Area Integrated systems of silicon-based logic-memory-sensors, Low-power semiconductor-type sensor platforms, Semiconductor materials and devices, 반도체 재료 및 소자, 실리콘 로직-메모리-센서 집적 시스템, 저전력 반도체 센서 플랫폼

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