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Detailed Information
Cu 배선공정에서 Al 중간층을 이용한 CVD-TiN 확산방지막의 성능 향상에 관한 연구
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- Authors
- Advisor
- 김기범
- Issue Date
- 2000
- Publisher
- 서울대학교 대학원
- Description
- 학위논문(석사)--서울대학교 대학원 :금속공학과,2000.
- Language
- Korean
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000068298
https://hdl.handle.net/10371/30666
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