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In-situ EIS of oxide film formed on nickel-plated alloy 600 : 니켈 도금 표면에 생성된 산화막의 전기화학적 특성에 관한 연구

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Authors

오시형

Advisor
황일순
Issue Date
2002
Publisher
서울대학교 대학원
Description
Thesis (master`s)--서울대학교 대학원 :원자핵공학과,2002.
Language
English
URI
http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000061854

https://hdl.handle.net/10371/33864
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