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광 리소그래피에서의 분해능과 초점심도 한계의 확장에 관한 연구와 물리교육에의 응용 : Study on extending the limits of resolution and depth of focus in optical lithography and its application to the physics education)

DC Field Value Language
dc.contributor.advisor이성묵-
dc.contributor.author박정보-
dc.date.accessioned2010-01-16T12:41:01Z-
dc.date.available2010-01-16T12:41:01Z-
dc.date.copyright2002.-
dc.date.issued2002-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000060744kor
dc.identifier.urihttps://hdl.handle.net/10371/34168-
dc.description학위논문(박사)--서울대학교 대학원 :과학교육과 물리전공,2002.ko
dc.format.extentxi, 147 p.ko
dc.language.isokoko
dc.publisher서울대학교 대학원ko
dc.subject광 리소그래피ko
dc.subjectoptical lithographyko
dc.subject초점심도ko
dc.subjectresolutionko
dc.subject벡터 회절ko
dc.subjectdepth of focusko
dc.subject타원 편광 조명ko
dc.subjectvector diffractionko
dc.subjectE-D Treeko
dc.subjectoptical proximity correction(OPC)ko
dc.title광 리소그래피에서의 분해능과 초점심도 한계의 확장에 관한 연구와 물리교육에의 응용ko
dc.title.alternativeStudy on extending the limits of resolution and depth of focus in optical lithography and its application to the physics education)ko
dc.typeThesis-
dc.contributor.department과학교육과 물리전공-
dc.description.degreeDoctorko
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