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초고집적 소자의 금속배선을 위한 화학증착 공정에서 계단도포성 개선을 위한 새로운 기술 : PACVD (Plasma assisted chemical vapor deposition) : A New technology for improvement of the step coverage in CVD process for ULSI metallization : PACVD (Plasma assisted chemical vapor deposition)
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- Authors
- Advisor
- 주승기
- Issue Date
- 1999
- Publisher
- 서울대학교 대학원
- Description
- 학위논문(박사)--서울대학교 대학원 :금속공학과,1999.
- Language
- Korean
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000071449
https://hdl.handle.net/10371/34590
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