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Ru과 RuO₂의 화학기상증착기구와 물성개선에 대한 연구 : A Study on the chemical vapor deposition of Ru and RuO₂thin film with ruthenocene precursor
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- Authors
- Advisor
- 김기범
- Issue Date
- 1999
- Publisher
- 서울대학교 대학원
- Keywords
- RuO₂ ; chemical vapor deposition ; Ru ; Ru incorporation rate ; ruthenocene precursor ; 화학기상증착 ; Ru 혼입속도
- Description
- 학위논문(박사)--서울대학교 대학원 :금속공학과,1999.
- Language
- Korean
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000071444
https://hdl.handle.net/10371/34594
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