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Issue Date	Title / Author(s) / Citation	File	Altmetrics
2022-08	High and Uniform Phosphorus Doping in Germanium Through a Modified Plasma Assisted Delta Doping Process With H<sub>2</sub> Plasma Treatment Jeong, Heejae; Kim, Y. S.; Baik, Seunghun; Kang, Hongki; Jang, Jae Eun; Kwon, Hyuk-Jun IEEE Electron Device Letters, Vol.43 No.8, pp.1315-1318	DOI