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유기금속 화학기상 증착법으로 Si기판에 형성한 Hf-기반 게이트 유전막의 성장 및 특성향상에 관한 연구 : Study of growth and characteristics enhancement of Hf-based gate dielectrics deposited by metal organic chemical vapor deposition
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- Authors
- Advisor
- 황철성
- Issue Date
- 2005
- Publisher
- 서울대학교 대학원
- Keywords
- HfO2 ; Hf-silicate ; gate oxide ; CVD
- Description
- 학위논문(석사)--서울대학교 대학원 :협동과정 나노과학기술전공,2005.
- Language
- Korean
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000050837
https://hdl.handle.net/10371/43556
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