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질소축적 측벽 산화막을 적용한 shallow trench isolation (STI)에 관한 연구
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- Authors
- Advisor
- 박병국
- Issue Date
- 2003
- Publisher
- 서울대학교 대학원
- Keywords
- shallow trench isolation (STI) ; Shallow trench isolation (sti) ; mechanical stress ; Mechanical stress ; nitrogen pile-up oxidation ; Initial o2 injection method ; reverse junction leakage ; Reverse junction leakage ; temperature ; Temperature ; deep level transient spectroscopy (DLTS) ; Deep level transient spectroscopy (dlts) ; hot carreir reliability ; Hot carrier reliability
- Description
- 학위논문(석사)--서울대학교 대학원 :전기·컴퓨터공학부,2003.
- Language
- Korean
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000059927
https://hdl.handle.net/10371/48356
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