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동시 스퍼터링법에 의한 강유전체 기억소자용 PZT와 BST 박막 제조 및 특성 향상에 관한 연구
A Study on the fabrication and improvement of PZT and BST thin films for the ferroelectric memory devices by co-sputtering method

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Authors
주재현
Advisor
주승기
Issue Date
1996
Publisher
서울대학교 대학원
Keywords
동시 스퍼터링PZT강유전체BST기억소자co-sputtering상변태ferroelectric전도기구memory device
Description
학위논문(박사)--서울대학교 대학원 :금속공학과,1996.
Language
Korean
URI
http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000081555

https://hdl.handle.net/10371/50872
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College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Materials Science and Engineering (재료공학부)Theses (Ph.D. / Sc.D._재료공학부)
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