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저온 화학증착에 의해 제조된 TiN의 우선방위와 접착력 : Preferred orientation and adhesion of titanium nitride films produced by low temperature chemical vapor deposition
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- Authors
- Advisor
- 김상주
- Issue Date
- 1995
- Publisher
- 서울대학교 대학원
- Keywords
- low temperature chemical vapor deposition ; 저온화학증착 ; titanium nitride ; 티타늄 나이트라이드 ; preferred orientation ; 우선방위 ; the lowest energy plane ; 최소에너지면 ; cleavage plane ; 벽개면
- Description
- 학위논문(박사)--서울대학교 대학원 :금속공학과,1995.
- Language
- Korean
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000085076
https://hdl.handle.net/10371/50879
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