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플라즈마 화학증착법을 이용한 (Ti[1-x]Al[x])N 박막의 제조 및 특성에 관한 연구 : Preparation and properties of the (Ti[1-x]Al[x])N coatings deposited by plasma enhanced chemical vapor deposition

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Authors

이상협

Advisor
이정중
Issue Date
1995
Publisher
서울대학교 대학원
Keywords
플라즈마 화학증착TiAlNAlN농도경사준안정상
Description
학위논문(박사)--서울대학교 대학원 :금속공학과,1995.
Language
Korean
URI
http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000084671

https://hdl.handle.net/10371/50889
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