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Low Dielectric Nanoporous Poly(methylsilsesquioxane) (PMSSQ) Films via Inorganic/Organic Hybrids
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- Authors
- Issue Date
- 2001-10-01
- Publisher
- Taylor & Francis
- Citation
- Mol. Cryst. Liq. Cryst., 371, 119
- Keywords
- Methylsilsesquioxane (MSSQ) ; nanoporosity ; dielectric constant ; thin film ; copolymeriation ; dehydroxylation
- Abstract
- Two types of methylsilsesquioxanes (MSSQ) were used as base matrix materials for nanoporous films. The hydrophilicity of MSSQ was controlled by copolymerization for the improved miscibility between MSSQs and star-shaped poly(caprolactone) (PCL) as a porogen. Linear relationship holds between porosity/refractive index and vol% of porogen upto 30%. Dielectric constant of porous MSSQ film could be reduced to 2.2 at the porosity of 30 vol%. Dielectric constant was very sensitive to the content of hydroxyl group of MSSQ and the the latter was reduced by treating surface silanols with hexamethyldisilazane
- ISSN
- 1542-1406 (print)
1563-5287 (online)
- Language
- English
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