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실리콘 산화막 식각반응기구 및 식각단면 모사에 관한 연구 : A Study on the surface-reaction mechanism of the silicon oxide and the silmulation of the etched surface
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- Authors
- Advisor
- 문상흡
- Issue Date
- 1997
- Publisher
- 서울대학교 대학원
- Keywords
- 프라즈마 ; plasma ; 프라즈마 상태함수 ; MERIE ; 특정 식각수율 ; plasma-state function ; specific etch yield ; RIE Lag
- Description
- 학위논문(박사)--서울대학교 대학원 :화학공학과,1997.
- Language
- Korean
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000079018
https://hdl.handle.net/10371/59472
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