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Relationship between indium tin oxide surface treatment and hole injection in C60 modified devices

DC Field Value Language
dc.contributor.authorKim, Sung Hyun-
dc.contributor.authorJang, Jyongsik-
dc.contributor.authorLee, Jun Yeob-
dc.date.accessioned2010-03-24T08:19:07Z-
dc.date.available2010-03-24T08:19:07Z-
dc.date.issued2006-
dc.identifier.citationApplied Physics Letters 89, 253501en
dc.identifier.issn0003-6951-
dc.identifier.urihttps://hdl.handle.net/10371/61899-
dc.description.abstractThe effect of indium tin oxide (ITO) surface treatment on hole injection in organic light-emitting
diode with C60 as a buffer layer on ITO was studied. Double surface dipole layer was induced on
oxygen plasma treated ITO surface, while no dipole formation was observed on ITO without surface
treatment. Interfacial energy barrier between ITO and hole transport layer was reduced by 0.4 eV by
C60 modification on oxygen plasma treated ITO surface, while there was no change of interfacial
energy barrier by C60 on ITO without surface treatment.
en
dc.language.isoenen
dc.publisherAmerican Institute of Physicsen
dc.titleRelationship between indium tin oxide surface treatment and hole injection in C60 modified devicesen
dc.typeArticleen
dc.contributor.AlternativeAuthor김성현-
dc.contributor.AlternativeAuthor장정식-
dc.contributor.AlternativeAuthor이준엽-
dc.identifier.doi10.1063/1.2410224-
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