S-Space College of Engineering/Engineering Practice School (공과대학/대학원) Dept. of Mechanical Aerospace Engineering (기계항공공학부) Journal Papers (저널논문_기계항공공학부)
Capillary force lithography: Large-area patterning, self-organization, and anisotropic dewetting
- Suh, K. Y.; Lee, Hong H.
- Issue Date
- John Wiley & Sons
- Adv. Funct. Mater. 2002, 12, 405
- THIN POLYMER-FILMS; TEMPERATURE IMPRINT LITHOGRAPHY; ASSEMBLED MONOLAYERS; SURFACES; MICROSTRUCTURES; Anisotropic dewetting; Lithography capillary force; Patterning 3D; Poly(dimethylsiloxanes) (PDMS)
- This article gives an overview on a new lithographic technique called capillary force lithography for large-area patterning. The technique simply involves placing a polydimethylsiloxane model on a polymer film, which is then heated above the glass-transition temperature of the polymer. Various useful microstructures can be obtained by sequential applications of the technique through self-organization. Dewetting, which can be observed in capillary force lithography for relatively thin films, is also described as a new pathway for realizing anisotropic dewetting.
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