SNU Open Repository and Archive: Surface Roughness Reducing Effect of Iodine Sources (CH3I, C2H5I) on Ru and RuO2 Composite Films Grown by MOCVD

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S-Space College of Engineering/Engineering Practice School (공과대학/대학원) Dept. of Chemical and Biological Engineering (화학생물공학부) Journal Papers (저널논문_화학생물공학부)

Surface Roughness Reducing Effect of Iodine Sources (CH3I, C2H5I) on Ru and RuO2 Composite Films Grown by MOCVD

Cited 30 time in Web of Science Cited 31 time in Scopus

Authors: Kim, Jae Jeong; Jung, Doo Hwan; Kim, Moon Soo; Kim, Sang Hyun; Yoon, Do Young

Issue Date: 2002-04

Publisher: Elsevier

Citation: Thin Solid Films 409 (2002) 28-32

Keywords: Chemical vapor deposition ; Surface roughness ; Ruthenium

ISSN: 0040-6090

Language: English

URI: https://hdl.handle.net/10371/63267

DOI: https://doi.org/10.1016/S0040-6090(02)00098-6

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Appears in Collections:: College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Chemical and Biological Engineering (화학생물공학부)Journal Papers (저널논문_화학생물공학부)

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