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College of Engineering/Engineering Practice School (공과대학/대학원)
Dept. of Material Science and Engineering (재료공학부)
Theses (Ph.D. / Sc.D._재료공학부)
(A) study on the instability of porous low-k dielectric in cu interconnect
다공성 저유전상수 물질의 열적 안정성 연구
- Authors
- 강석훈
- Advisor
- 오규환
- Issue Date
- 2010
- Publisher
- 서울대학교 대학원
- Keywords
- 저유전상수 물질; porous low-k dielectric material; 구리 배선; interconnect; 다공성; porosity; 열응력; thermal stress; 탄성계수; Youngs modulus; 열분해; thermal decomposition; 수축; SiCOH; 기공; MSSQ; 구리 배선 밀도; FTIR; kinetics; contraction; voiding; Cu pattern density; blanket film; cross-links
- Description
- Thesis(doctors) --서울대학교 대학원 :재료공학부,2010.2.
- Language
- English
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000032457
http://hdl.handle.net/10371/63874
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