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Charaterization of 5-aminotetrazole (ATRA) as a corrosion inhibitor in copper chemical mechanical polishing
Cited 30 time in
Web of Science
Cited 38 time in Scopus
- Authors
- Issue Date
- 2005-10-24
- Publisher
- Electrochemical Society
- Citation
- Journal of The Electrochemical Society, 152 (12), C827-C831
- Keywords
- copper ; corrosion inhibitors ; chemical mechanical polishing ; metallisation ; etching ; Fourier transform spectra ; infrared spectra ; ultraviolet spectra ; visible spectra ; pH ; polymerisation ; slurries ; solubility
- Abstract
- In the Cu metallization process, it is important to prevent corrosion and recession of metal lines resulting from chemical reactions
during the chemical mechanical polishing CMP process. In this paper, 5-aminotetrazole ATRA is investigated as a corrosion
inhibitor for Cu CMP. In the wet etch test, it was found that the etch rate of ATRA decreased with concentration. The potentiodynamic
polarization test and chronoamperometry test results revealed that ATRA could inhibit the Cu surface against corrosion
more effectively than benzotriazole BTA below 0.01 M. Fourier transform infrared and ultraviolet-visible analysis clearly
demonstrated that ATRA dissociated more easily in all pH ranges and could be polymerized faster and more effectively than BTA.
Therefore, both corrosion and recession could be considerably reduced after CMP by using slurry containing ATRA. Furthermore,
from the results of defect review after CMP, it was found that defects such as slurry residue, pit corrosion, and particles were
effectively prevented due to small molecular size and high solubility of ATRA.
- ISSN
- 0013-4651
- Language
- English
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