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Acceleration Effect of CuCN in Ag Electroplating for Ultralarge-Scale Interconnects
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Cho, Sung-Ki | - |
dc.contributor.author | Lee, Jong Kyun | - |
dc.contributor.author | Kim, Soo-Kil | - |
dc.contributor.author | Kim, Jae Jeong | - |
dc.date.accessioned | 2010-07-05T05:54:53Z | - |
dc.date.available | 2010-07-05T05:54:53Z | - |
dc.date.issued | 2007-08-03 | - |
dc.identifier.citation | Electrochemical and Solid-State Letters, 10(10), D116-D119 | en |
dc.identifier.issn | 1099-0062 | - |
dc.identifier.uri | https://hdl.handle.net/10371/68285 | - |
dc.description.abstract | The addition of CuCN accelerated the deposition rate in cyanide-based Ag electroplating. The catalytic effect came from the
high-order complexation of Cu with the free CN− ions in electrolyte. It changed the equilibrium state of the electrolyte, presented as an increase in the amount of Ag CN 2 − compared to Ag CN 3 2−. Because Ag CN 2 − could be reduced more easily, Ag electroplating was accelerated. Fourier transform infrared analysis showed the equilibrium change with the increase in Ag CN 2 − peak according to the CuCN addition. For superfilling, it is necessary to localize the complexation on the Cu surface. | en |
dc.description.sponsorship | This work was supported by the Korea Science and Engineering
Foundation through the Research Center for Energy Conversion and Storage RCECS , Dongbu HiTeK, and also by the Institute of Chemical Processes ICP . | en |
dc.language.iso | en | en |
dc.publisher | Electrochemical Society | en |
dc.title | Acceleration Effect of CuCN in Ag Electroplating for Ultralarge-Scale Interconnects | en |
dc.type | Article | en |
dc.contributor.AlternativeAuthor | 조성기 | - |
dc.contributor.AlternativeAuthor | 이종균 | - |
dc.contributor.AlternativeAuthor | 김수길 | - |
dc.contributor.AlternativeAuthor | 김재정 | - |
dc.identifier.doi | 10.1149/1.2769103 | - |
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