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Acceleration Effect of CuCN in Ag Electroplating for Ultralarge-Scale Interconnects

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dc.contributor.authorCho, Sung-Ki-
dc.contributor.authorLee, Jong Kyun-
dc.contributor.authorKim, Soo-Kil-
dc.contributor.authorKim, Jae Jeong-
dc.date.accessioned2010-07-05T05:54:53Z-
dc.date.available2010-07-05T05:54:53Z-
dc.date.issued2007-08-03-
dc.identifier.citationElectrochemical and Solid-State Letters, 10(10), D116-D119en
dc.identifier.issn1099-0062-
dc.identifier.urihttps://hdl.handle.net/10371/68285-
dc.description.abstractThe addition of CuCN accelerated the deposition rate in cyanide-based Ag electroplating. The catalytic effect came from the
high-order complexation of Cu with the free CN− ions in electrolyte. It changed the equilibrium state of the electrolyte, presented
as an increase in the amount of Ag CN 2
− compared to Ag CN 3
2−. Because Ag CN 2
− could be reduced more easily, Ag electroplating
was accelerated. Fourier transform infrared analysis showed the equilibrium change with the increase in Ag CN 2
− peak
according to the CuCN addition. For superfilling, it is necessary to localize the complexation on the Cu surface.
en
dc.description.sponsorshipThis work was supported by the Korea Science and Engineering
Foundation through the Research Center for Energy Conversion and
Storage RCECS , Dongbu HiTeK, and also by the Institute of
Chemical Processes ICP .
en
dc.language.isoenen
dc.publisherElectrochemical Societyen
dc.titleAcceleration Effect of CuCN in Ag Electroplating for Ultralarge-Scale Interconnectsen
dc.typeArticleen
dc.contributor.AlternativeAuthor조성기-
dc.contributor.AlternativeAuthor이종균-
dc.contributor.AlternativeAuthor김수길-
dc.contributor.AlternativeAuthor김재정-
dc.identifier.doi10.1149/1.2769103-
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