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Low driving voltage and high stability organic light-emtting diodes with rhenium oxide-doped hole transporting layer

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dc.contributor.authorLeem, Dong-Seok-
dc.contributor.authorPark, Hyung-Dol-
dc.contributor.authorKang, Jae-Wook-
dc.contributor.authorLee, Jae-Hyun-
dc.contributor.authorKim, Ji Whan-
dc.contributor.authorKim, Jang-Joo-
dc.date.accessioned2009-08-12T05:50:15Z-
dc.date.available2009-08-12T05:50:15Z-
dc.date.issued2007-07-05-
dc.identifier.citationAppl. Phys. Lett. 91, 011113 (2007)en
dc.identifier.issn0003-6951 (print)-
dc.identifier.issn1077-3118 (online)-
dc.identifier.urihttps://hdl.handle.net/10371/7016-
dc.description.abstractThe authors report a promising metal oxide-doped hole transporting layer (HTL) of rhenium oxide (ReO3)-doped N,N-diphenyl-N,N-bis (1,1-biphenyl)-4,4-diamine (NPB). The tris(8-hydroxyquinoline) aluminum-based organic light-emitting diodes with ReO3-doped NPB HTL exhibit driving voltage of 5.2–5.4 V and power efficiency of 2.2–2.3 lm/W at 20 mA/cm2, which is significantly improved compared to those (7.1 V and 2.0 lm/W, respectively) obtained from the devices with undoped NPB. Furthermore, the device with ReO3-doped NPB layer reveals the prolonged lifetime than that with undoped NPB. Details of ReO3 doping effects are described based on the UV-Vis absorption spectra and characteristics of hole-only devices.en
dc.description.sponsorshipThe authors thank the Ministry of Commerce, Industry,
and Energy, Samsung SDI, and Dongwoo Finechem. Co. for
their financial support of this work.
en
dc.language.isoen-
dc.publisherAmerican Institute of Physicsen
dc.titleLow driving voltage and high stability organic light-emtting diodes with rhenium oxide-doped hole transporting layeren
dc.typeArticleen
dc.contributor.AlternativeAuthor임동석-
dc.contributor.AlternativeAuthor박형돌-
dc.contributor.AlternativeAuthor강재욱-
dc.contributor.AlternativeAuthor이재현-
dc.contributor.AlternativeAuthor김지환-
dc.contributor.AlternativeAuthor김장주-
dc.identifier.doi10.1063/1.2754635-
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