S-Space College of Engineering/Engineering Practice School (공과대학/대학원) Dept. of Material Science and Engineering (재료공학부) Journal Papers (저널논문_재료공학부)
Fabrication of multimode polymeric waveguides and micromirrors using deep x-ray lithography
- Kim, Joon-Sung; Kim, Jang-Joo
- Issue Date
- IEEE Photon. Technol. Lett., vol. 16, pp. 798-800, Mar. 2004
- X-ray lithography; elastomers; micromirrors; optical fabrication; optical interconnections; optical losses; optical polymers; optical waveguides; polymeric multimode waveguide
- Multimode polymeric waveguides and 45° micromirrors have been fabricated using deep X-ray lithography. Polymethylmetacrylate was used as a core layer and silica and silicone elastomer as a lower and upper cladding layer, respectively. The propagation loss of the waveguide was 0.54 dB/cm at 830 nm and the loss of micromirrors was less than 0.43 dB at the wavelength. The X-ray lithography technique offers the controllability of mirror angles to 45° and -45° so that it gives flexibility to the system architecture of optical interconnections.