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Fabrication of high aspect ratio nanostructures using capillary force lithography

Cited 8 time in Web of Science Cited 8 time in Scopus
Authors
Suh, Kahp Yang; Jeong, Hoon Eui; Park, Jee Won; Lee, Sung Hoon; Kim, Jae Kwan
Issue Date
2006-07
Publisher
한국화학공학회 = Korean Institute of Chemical Engineers (KIChE); Springer Verlag
Citation
Korean J. Chem. Eng., 23, 678 (2006)
Keywords
capillary force lithographynanostructuresaspect ratiolaplace pressureSOFT LITHOGRAPHYNANOIMPRINT LITHOGRAPHYSTAMPSMICROSTRUCTURESRESOLUTIONSISTABILITYSURFACESCRYSTALLASER
Abstract
A new ultraviolet (UV) curable mold consisting of fanctionalized polyurethane with acrylate group (MINS101m, Minuta Tech.) has recently been introduced as an alternative to replace polydimethylsiloxane (PDMS) mold for sub-100-nm lithography. Here, we demonstrate that this mold allows for fabrication of various high aspect ratio nanostructures with an aspect ratio as high as 4.4 for 80 nm nanopillars. For the patterning method, we used capillary force lithography (CFL) involving direct placement of a polyurethane acrylate mold onto a spin-coated polymer film followed by raising the temperature above the glass transition temperature of the polymer (T). For the patterning materials, thermoplastic resins such as polystyrene (PS) and poly(methyl methacrylate) (PMMA) and a zinc oxide (ZnO) precursor were used. For the polymer, micro/nanoscale hierarchical structures were fabricated by using sequential application of the same method, which is potentially useful for mimicking functional surfaces such as lotus leaf.
ISSN
0256-1115 (print)
1975-7220 (online)
Language
English
URI
http://hdl.handle.net/10371/7497
DOI
https://doi.org/10.1007/BF02706814
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College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Mechanical Aerospace Engineering (기계항공공학부)Journal Papers (저널논문_기계항공공학부)
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