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Inorganic polymer photoresist for direct ceramic patterning by photolithography
Cited 15 time in
Web of Science
Cited 20 time in Scopus
- Authors
- Issue Date
- 2007
- Publisher
- Royal Society of Chemistry
- Citation
- Chem. Commun., 2007, 39, 4021
- Keywords
- SICN MEMS ; FABRICATION ; MICROSTRUCTURES ; COMPOSITES
- Abstract
- A novel negative, inorganic polymer photoresist was demonstrated to be suitable for simple and direct fabrication of tribological SiCN-based ceramic microstructures via UV photolithography and subsequent pyrolysis at 800 degrees C.
- ISSN
- 1359-7345
- Language
- English
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