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Generation and Self-Replication of Monolithic, Dual-Scale Polymer Structures by Two-Step Capillary-Force Lithography

Cited 59 time in Web of Science Cited 61 time in Scopus
Authors
Jeong, Hoon Eui; Kwak, Rhokyun; Kim, Jae Kwan; Suh, Kahp Y.
Issue Date
2008-11
Publisher
Wiley-Blackwell
Citation
Small 2008, 4, 1913
Keywords
capillary-force lithographydual-structure surfacesmicrostructuresnanostructuresSUPER-HYDROPHOBIC SURFACESUPERHYDROPHOBIC SURFACEIMPRINT LITHOGRAPHYACRYLATE COATINGSOXYGEN INHIBITIONNANOSTRUCTURESMICROFABRICATIONDEPOSITIONCREATION
Abstract
Inhibition effects in UV radiation curing caused by oxygen are used for fabricating monolithic, micro/nanoscale hierarchical polymer structures via a two-step UV-assisted capillary molding technique (see image). Using this approach, various dual-scale polymer structures are created within a few minutes with precise control over geometrical parameters.
ISSN
1613-6810
Language
English
URI
http://hdl.handle.net/10371/9625
DOI
https://doi.org/10.1002/smll.200800151
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College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Mechanical Aerospace Engineering (기계항공공학부)Journal Papers (저널논문_기계항공공학부)
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