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Showing results 1 to 11 of 11
Issue Date
Title / Author(s) / Citation
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1997
PECVD법에 의해 제조된 TiN 박막의 증착 특성 및 내부 응력
송병창
link
1998
Cu 배선공정에서 확산방지막으로서 TiN 박막에 대한 연구
박기철
link
2003
Diffusion barriers for copper metallization :
김수현
link
2003
Ti 탈산강의 응고 중 생성되는 비금속 개재물 특성
이상윤
link
2004
Deposition behaviors of Ru thin films prepared by chemical vapor deposition and their application to the electrodes of the DRAM devices
강상열
link
2006
Study on the double threshold switching effect in bi-layer structure of PRAM and the feasibility for multi-level operation
전현구
link
2007
Numerical studies on PACVD processes used for TiN multifunctional films using metal organic precursors
손석재
link
2009
DRAM에 응용되는 이산화티타늄을 기반으로 한 산화박막의 증착거동 및 유전특성 개선에 관한 연구
최규진
link
2014-02
Highly Conductive TiN Coating of Si Nanocomposite for Li-ion Batteries
박진환
view file
2021
Modified atomic layer deposition processes of the Ru electrode thin films for next generation DRAM capacitor
권대선
view file
link
2023
3D DRAM 용 하부 기판과 전극에 따른 a-IGZO 특성 연구
이선진
view file
link
1